Nanoimprint lithography
The 5microns GmbH is the exclusive European distributor of Gdnano Ltd., a leading Chinese manufacturer of tools for nanoimprint lithography (NIL) processes.
Official distributor of
Here you can find detailed information about our systems. Click the respective buttons to go directly to a specific section.
Maximum flexibility with the GD-N-03
The GD-N-03 nanoimprinting tool is the perfect addition to your lab in order to unlock new applications in the realm of nanotechnology. The GD-N-03 integrates well into the process flow due to its capability to be refitted quickly to changing substrate and stamp diameters. Design and realization of the tool is guided by the principle “keep it simple!” which guarantees solid processing and high reproducibility.
The GD-N-03 is a Soft UV-NIL tool. Features on a soft polymer stamp are transferred via a fully automated imprinting process onto the resist on the substrate. The built-in UV lamp cures and stabilizes the structured resist. Utilizing soft stamps instead of hard stamps has the advantage that the process is rather insensitive to single dust particles on either the stamp or the substrate. In-house production of soft stamps is realized easily with the tools provided with the GD-N-03. The process is easy to learn, and can be applied quickly by student assistants.
GD-N-03 at a glance
- Substrate sizes from 2 inch to 200 mm (8 inch)
as well as customer specified - Easy, in-house stamp production
- Only 230 V mains and pressurized air required
- Automated imprinting and demoulding
- Footprint < 1 m²
Official distributor of
Not only the operation of the tool is uncomplicated, it also requires little in terms of infrastructure: a 230 V mains supply and pressurized air or pressurized nitrogen is all you need. And with a footprint of less than 1 m x 1 m, there’s a place for the GD-N-03 in every lab.
Optical alignment with the GD-N-03A
Official distributor of
GD-N-03A at a glance
- Substrate sizes from 2 inch to 150 mm (6 inch)
as well as customer specified - Optical alignment of the stamps with an accuracy of 1 µm
- Easy, in-house stamp production
- Only 230 V mains and pressurized air required
- Automated imprinting and demoulding
- Footprint < 2 m²
The enhanced version of the GD-N-03, the GD-N-03A, includes an optical adjustment system that allows you to align the stamp relatively to elements of an already structured substrate. The optical system consists of two CCD microscope cameras with a magnification of up to a factor of 2000. The positioning of the cameras relative to the stamp is manually performed by the user. By default, the substrate table is also aligned via fine thread screws by the user. Optionally, this can be automated with piezo actuators. When the stamp is aligned and ready the adjustment system slides aside making room for the UV light unit.
Hybrid stamps for highest resolution
You can also use the newly developed hybrid stamps which enable the moulding of very small structures. The unique hybrid stamp structure combines the advantages of hard and soft NIL stamps. The structure-bearing layer of PDMS is manufactured in a simple manufacturing process on a thin glass film. The hybrid stamp preserves the high resolution and mechanical stability of hard stamps. But simultaneously, the hybrid stamp is still flexible enough to ensure a conformal contact across the substrate. Therefore, particles have no effect on the entire process result. The cost effective replication of master substrates is another advantage of the hybrid stamp.
 The hybrid stamp combines the benefits of hard and soft stamps |
Ask us!
Do you have any questions about nanoimprint lithography or our tools in particular?
We will gladly advise you on an individual, non-committal basis.
We have a demonstration unit at your service in the cleanroom facilities of our technology partner, the Center for Micro- and Nanotechnologies at the Technische Universität Ilmenau. It will be our pleasure to demonstrate the GD-N-03 to our customers and show them how cost-efficient and simple its operation is. We also demonstrate how well nanoimprint lithography integrates into standard process chains of micro- and nanofabrication.
By the way, we offer all NIL processes as a service, too.
Specifications
| Substrates | Processing of chips and wafers up to 8 inch diameter Substrate chucks for 2, 4, 6 and 8 inch wafers as well as customer specified chucks Substrate thickness from 0,3 mm to 15 mm Suitable for all materials (silicon, glass, ceramics, etc.) |
| Stamps | Processing of soft stamps Stamp holders for circular 2, 4, 6, and 8 inch substrates as well as customer specified stamp holders All tools for in-house stamp manufacturing included |
| UV nanoimprint | UV broad-band lamp with 400 W Option: customer specified line filters Imprint pressure range 0 MPa … 0,5 MPa |
| Dimensions, etc. | Dimensions 600 mm x 740 mm x 1447 mm Required infrastructure: Pressurized air, 230 V AC Clean room compatabiliy: Class 100 |
| Substrate | Processing of chips, and wafers up to 6 inch diameter Substrate chucks for 2, 4, and 6 inch wafers as well as customer specified chucks Substrate thickness from 0,3 mm to 15 mm Suitable for all materials (silicon, glass, ceramics, etc.) |
| Stamps | Processing of soft and hybrid stamps Stamp holders for circular 2, 4, and 6 inch substrates as well as customer specified stamp holders All tools for in-house stamp manufacturing included |
| Optical alignment | Dual camera setup for top side alignment Magnification up to x2000 Adjustable substrate chuck with 4 degrees of freedom (x, y, z, and theta) Manual alignment with precision set screws Option: Automised alignment with piezo actuator stage |
| UV nanoimprint | UV broad-band lamp with 400 W Option: customer specified line filters Imprint pressure range 0 MPa … 0,5 MPa |
| Dimensions, etc. | Dimensions 1300 mm x 750 mm x 1550 mm Required infrastructure: Pressurized air, 230 V AC Clean room compatabiliy: Class 100 |
Designed by 5microns