Here you can find detailed information about consumables for the UV nanoimprint lithograpy. Click the respective buttons to go directly to a specific section.
The resists can be applied to a variety of substrate materials (silicon, glass, metals, and ceramics) and thus provide solutions for all kinds of applications. A structural accuracy of less than 10 nm is achievable with all available resists. Resist thickness can be adjusted precisely by spin coating from 25 nm up to 1500 nm. PDMS or XPDMS stamps are best suited for our resists.
The masters required for the production of soft stamps are obtainable from 5microns GmbH as well. We offer you a set of standard masters with gratings or cylindrical structures in a lattice. Of course, we also make you an offer for your tailor-made master.
|Lines and Spaces||300 nm, 400 nm, 500 nm und 600 nm|
|Layer thickness||on Silicon substrates up to 300 nm
on quartz substrates up to 150 nm
|P350s||350 nm||square||Holes||20 x 20 mm²||Si < 300 nm / Quartz < 150 nm||Silicon or quartz,|
4″ Wafer or smaller
|P520h||520 nm||hexagonal||Holes||20 x 20 mm²||Si < 450 nm Quartz < 200 nm|
|P600h||600 nm||hexagonal||Holes||46 x 46 mm²|
|P600h4||600 nm||hexagonal||Holes||4 Zoll (-95%)|
|P780h||780 nm||hexagonal||Holes||20 x 20 mm²|
|P1000h||1000 nm||hexagonal||Holes||20 x 20 mm²|
|P1500h||1500 nm||hexagonal||Holes||20 x 20 mm²|
|P600hp||600 nm||hexagonal||Pillars||46 x 46 mm²|
|P780hp||780 nm||hexagonal||Pillars||20 x 20 mm²|
|P1000hp||780 nm||hexagonal||Pillars||20 x 20 mm²|
|P1500hp||1500 nm||hexagonal||Pillars||20 x 20 mm²|