Resists and Masters

Here you can find detailed information about consumables for the UV nanoimprint lithograpy. Click the respective buttons to go directly to a specific section.

Resists

The resists can be applied to a variety of substrate materials (silicon, glass, metals, and ceramics) and thus provide solutions for all kinds of applications. A structural accuracy of less than 10 nm is achievable with all available resists. Resist thickness can be adjusted precisely by spin coating from 25 nm up to 1500 nm. PDMS or XPDMS stamps are best suited for our resists.


NIL-UV-Solid: low-viscosity UV NIL resist

  • Structural fidelity down to 10 nm
  • Low residual layer thickness down to 10 nm
  • High aspect ratio
  • Resist thickness adjustable between 25 nm and 1500 nm
  • Curing without vacuum
  • High etch selectivity
  • Stamp materials: Silicon, quartz, nickel, NIL-Quick Stamp, PDMS, and more polymers
  • Substrate materials: Silicon, quartz, sapphire, GaAs, InP, GaN, Ti, Au, and more

NIL-UV-Fast: Fast curing

  • Low-viscous UV NIL resist
  • Structural fidelity down to 10 nm
  • Fast curing within 5 seconds of a UV exposure with 350 W
  • Resist thickness adjustable between 30 nm and 1400 nm
  • Low residual layer thickness down to 10 nm
  • High aspect ratio
  • High etch selectivity
  • Stamp materials: Silicon, quartz, nickel, NIL-Quick Stamp, PDMS, and more polymers
  • Substrate materials: Silicon, quartz, sapphire, GaAs, InP, GaN, Ti, Au, and more

Masters

The masters required for the production of soft stamps are obtainable from 5microns GmbH as well. We offer you a set of standard masters with gratings or cylindrical structures in a lattice. Of course, we also make you an offer for your tailor-made master.

Lines and Spaces 300 nm, 400 nm, 500 nm und 600 nm
Layer thickness on Silicon substrates up to 300 nm
on quartz substrates up to 150 nm

Name Period Lattice Type Area Layer thickness Substrates
P350s 350 nm square Holes 20 x 20 mm² Si < 300 nm / Quartz < 150 nm Silicon or quartz,
4″ Wafer or smaller
P520h 520 nm hexagonal Holes 20 x 20 mm² Si < 450 nm Quartz < 200 nm
P600h 600 nm hexagonal Holes 46 x 46 mm²
P600h4 600 nm hexagonal Holes 4 Zoll (-95%)
P780h 780 nm hexagonal Holes 20 x 20 mm²
P1000h 1000 nm hexagonal Holes 20 x 20 mm²
P1500h 1500 nm hexagonal Holes 20 x 20 mm²
P600hp 600 nm hexagonal Pillars 46 x 46 mm²
P780hp 780 nm hexagonal Pillars 20 x 20 mm²
P1000hp 780 nm hexagonal Pillars 20 x 20 mm²
P1500hp 1500 nm hexagonal Pillars 20 x 20 mm²

  • Silicon or Quartz substrate
  • Round substrates up to 6 inch, square substrates up to 5 inch
  • Structural fidelity down to 20 nm
  • Anti-sticking layer
  • Dicing

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