Nanoimprint lithography

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Maximum flexibility with the GD-N-03

The GD-N-03 nanoimprinting tool is the perfect addition to your lab in order to unlock new applications in the realm of nanotechnology. The GD-N-03 integrates well into the process flow due to its capability to be refitted quickly to changing substrate and stamp diameters. Design and realization of the tool is guided by the principle “keep it simple!” which guarantees solid processing and high reproducibility.

The GD-N-03 is a Soft UV-NIL tool. Features on a soft polymer stamp are transferred via a fully automated imprinting process onto the resist on the substrate. The built-in UV lamp cures and stabilizes the structured resist. Utilizing soft stamps instead of hard stamps has the advantage that the process is rather insensitive to single dust particles on either the stamp or the substrate. In-house production of soft stamps is realized easily with the tools provided with the GD-N-03. The process is easy to learn, and can be applied quickly by student assistants.

GD-N-03 at a glance

  • Substrate sizes from 2 inch to 200 mm (8 inch)
    as well as customer specified
  • Easy, in-house stamp production
  • Only 230 V mains and pressurized air required
  • Automated imprinting and demoulding
  • Footprint < 1 m²

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Nanoimprinting with the GD-N-03 is a simple process. The user only has to specify exposure time and the applied pressure. We have produced this video to show you how easy the operation of the GD-N-03 is:

Not only the operation of the tool is uncomplicated, it also requires little in terms of infrastructure: a 230 V mains supply and pressurized air or pressurized nitrogen is all you need. And with a footprint of less than 1 m x 1 m, there’s a place for the GD-N-03 in every lab.

Optical alignment with the GD-N-03A

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GD-N-03A at a glance

  • Substrate sizes from 2 inch to 150 mm (6 inch)
    as well as customer specified
  • Optical alignment of the stamps with an accuracy of 1 µm
  • Easy, in-house stamp production
  • Only 230 V mains and pressurized air required
  • Automated imprinting and demoulding
  • Footprint < 2 m²

The enhanced version of the GD-N-03, the GD-N-03A, includes an optical adjustment system that allows you to align the stamp relatively to elements of an already structured substrate. The optical system consists of two CCD microscope cameras with a magnification of up to a factor of 2000. The positioning of the cameras relative to the stamp is manually performed by the user. By default, the substrate table is also aligned via fine thread screws by the user. Optionally, this can be automated with piezo actuators. When the stamp is aligned and ready the adjustment system slides aside making room for the UV light unit.

Alignment of dot patterns within lines and spaces

Alignment of dot patterns within lines and spaces

Precise manual alignment

Precise manual alignment

Hybrid stamps for highest resolution

You can also use the newly developed hybrid stamps which enable the moulding of very small structures. The unique hybrid stamp structure combines the advantages of hard and soft NIL stamps. The structure-bearing layer of PDMS is manufactured in a simple manufacturing process on a thin glass film. The hybrid stamp preserves the high resolution and mechanical stability of hard stamps. But simultaneously, the hybrid stamp is still flexible enough to ensure a conformal contact across the substrate. Therefore, particles have no effect on the entire process result. The cost effective replication of master substrates is another advantage of the hybrid stamp.

Sub 100 nm resolution with a hybrid stamp

Sub 100 nm resolution with a hybrid stamp

The hybrid stamp combines the benefits of hard and soft stamps

The hybrid stamp combines the benefits of hard and soft stamps

Ask us!

Do you have any questions about nanoimprint lithography or our tools in particular?
We will gladly advise you on an individual, non-committal basis.

We have a demonstration unit at your service in the cleanroom facilities of our technology partner, the Center for Micro- and Nanotechnologies at the Technische Universität Ilmenau. It will be our pleasure to demonstrate the GD-N-03 to our customers and show them how cost-efficient and simple its operation is. We also demonstrate how well nanoimprint lithography integrates into standard process chains of micro- and nanofabrication.

By the way, we offer all NIL processes as a service, too.

 
 

Specifications

 

Substrates Processing of chips and wafers up to 8 inch diameter
Substrate chucks for 2, 4, 6 and 8 inch wafers as well as customer specified chucks
Substrate thickness from 0,3 mm to 15 mm
Suitable for all materials (silicon, glass, ceramics, etc.)
Stamps Processing of soft stamps
Stamp holders for circular 2, 4, 6, and 8 inch substrates as well as customer specified stamp holders
All tools for in-house stamp manufacturing included
UV nanoimprint UV broad-band lamp with 400 W
Option: customer specified line filters
Imprint pressure range 0 MPa … 0,5 MPa
Dimensions, etc. Dimensions 600 mm x 740 mm x 1447 mm
Required infrastructure: Pressurized air, 230 V AC
Clean room compatabiliy: Class 100

Substrate Processing of chips, and wafers up to 6 inch diameter
Substrate chucks for 2, 4, and 6 inch wafers as well as customer specified chucks
Substrate thickness from 0,3 mm to 15 mm
Suitable for all materials (silicon, glass, ceramics, etc.)
Stamps Processing of soft and hybrid stamps
Stamp holders for circular 2, 4, and 6 inch substrates as well as customer specified stamp holders
All tools for in-house stamp manufacturing included
Optical alignment Dual camera setup for top side alignment
Magnification up to x2000
Adjustable substrate chuck with 4 degrees of freedom (x, y, z, and theta)
Manual alignment with precision set screws
Option: Automised alignment with piezo actuator stage
UV nanoimprint UV broad-band lamp with 400 W
Option: customer specified line filters
Imprint pressure range 0 MPa … 0,5 MPa
Dimensions, etc. Dimensions 1300 mm x 750 mm x 1550 mm
Required infrastructure: Pressurized air, 230 V AC
Clean room compatabiliy: Class 100

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